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NbOx Target

NbOx Target


Product introduction

With plasma as the heat source, high purity and high density NbOx targets are produced from respective powders, which are heated to molten or semi-molten state and deposited on the surface of backing tube at high speeds to form dense coatings, The Ag target material adopts a binding process.


Applications

Low-E glasses

Film solar cells

TFT-LCD

Semico-nductor devices


Specifications

Chemical composition(wt%)NbOx
Purity(%)≥99.9
Densit(g/cm3)≥4.8
ImpuritiesTa≤200 Si≤80 Al≤30 Cu≤30 Ti≤100 Fe≤80
Total impurity≤1000
Electrical resistivity(Ω·cm)≤0.2
Backing tube304/316L stainless steel(non-magnetic)
DimensionAccording to the customized drawings


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